| 摘要 |
<p>The present invention relates to a cerium oxide and a production method thereof. Especially, it is an object of the present invention to provide a cerium oxide which realizes a high smoothness comparable to that of colloidal silica and has a large polishing rate. Further, the present invention provides a cerium oxide which has good cleaning properties of the polishing surface after polishing. The present invention relates to a cerium oxide having an average particle size of 0.5 μm or less and a crystallite diameter of 8 nm to 80 nm, characterized in that the cerium oxide settles out in 3 mass % aqueous brine to a predetermined sedimentation volume when the cerium oxide is formed as a slurry containing cerium oxide in a concentration of 2 mass %, and the sedimentation volume after leaving the cerium oxide slurry to stand for 24 hours after stirring is 2.5 to 15.0 mL/g.</p> |
