发明名称 MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
摘要 <p>A multilayer mirror is constructed and arranged to reflect radiation having a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers U and B9C layers, Th and B9C layers, La and B layers, C and B layers, U and B layers, and Th and B layers.</p>
申请公布号 WO2009147014(A1) 申请公布日期 2009.12.10
申请号 WO2009EP56130 申请日期 2009.05.20
申请人 ASML NETHERLANDS B.V.;GLUSHKOV, DENIS;BANINE, VADIM;MOORS, JOHANNES, HUBERTUS, JOSEPHINA;SJMAENOK, LEONID, AIZIKOVITCH;SALASCHENKO, NIKOLAI NIKOLAEVICH 发明人 GLUSHKOV, DENIS;BANINE, VADIM;MOORS, JOHANNES, HUBERTUS, JOSEPHINA;SJMAENOK, LEONID, AIZIKOVITCH;SALASCHENKO, NIKOLAI NIKOLAEVICH
分类号 G03F7/20;G03F1/14;G21K1/06 主分类号 G03F7/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利