| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter in which, even when a dye-containing positive photoresist using a dye whose solubility in an aqueous alkali solution is not adequate is used, uneven development is suppressed. <P>SOLUTION: The method for manufacturing a color filter includes: a step S1 of applying a dye-containing positive photoresist on a color filter formation surface; a step S2 of patternwise exposing a coating film of the dye-containing positive photoresist; a step S3 of performing development with a first developer; a step S4 of removing, with a second developer, residues on development comprising the dye which cannot be removed with the first developer and is hardly removed with alkali; a step S5 of rinsing the second developer with a third developer; and a step S6 of rinsing the third developer. <P>COPYRIGHT: (C)2010,JPO&INPIT |
