| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve exposure that does not deteriorate uniformity of an accumulated exposure amount on a face to be irradiated even when exposure conditions accompanying a change in an effective radius of a secondary light source are changed in a scanning-type projection exposure device. <P>SOLUTION: A slit-shaped lighting region on a first object is irradiated with a light from a light source via a slit of an illumination optical system. The pattern of the first object is projected onto a second object via the projection optical system. In a projection exposure device, in which the first object and the second object are synchronously scanned and the second object is exposed by the pattern of the first object, the first object is irradiated with the light so that an light intensity distribution in the scanning direction on the first object has an inclination part. When an effective radius of the secondary light source is R and a distance between the slit and the first object or its conjugate face is d in the illumination optical system, control means is provided which changes d according to the change in R. The control means increases d when reducing R and reduces d when increasing R. <P>COPYRIGHT: (C)2010,JPO&INPIT |
