PHOTOSENSITIVE RESIN COMPOSITION COMPRISING NOVEL MULTI-FUNCTIONAL MONOMER

摘要

PURPOSE: A novel photoresist resin composition is provided to show an excellent sensitivity, a rapid development rate and an excellent surface roughness and to improve the dispersion stability of a colorant. CONSTITUTION: A novel photoresist resin composition comprises a multifunctional monomer having a plurality of (meth)acryl groups and a polyoxyethylene group. The multifunctional monomer is represented by the formulas 1 ~ 5, wherein R are independently an alkylene group of the carbon number 1 ~ 20; X are independently -O-, -N-, and -S- or -COO-; R1 are independently a hydrogen atom, or an alkyl group of the carbon number 1 ~ 10; and n is independently an integer of 1 ~ 30.