发明名称 High-k thin film grain size control
摘要 A method including depositing a suspension of a colloid comprising an amount of nano-particles of a ceramic material on a substrate; and thermally treating the suspension to form a thin film. A method including depositing a plurality of nano-particles of a ceramic material to pre-determined locations across a surface of a substrate; and thermally treating the plurality of nano-particles to form a thin film. A system including a computing device comprising a microprocessor, the microprocessor coupled to a printed circuit board through a substrate, the substrate comprising at least one capacitor structure formed on a surface, the capacitor structure comprising a first electrode, a second electrode, and a ceramic material disposed between the first electrode and the second electrode, wherein the ceramic material comprises columnar grains.
申请公布号 US7629269(B2) 申请公布日期 2009.12.08
申请号 US20050096315 申请日期 2005.03.31
申请人 INTEL CORPORATION 发明人 PALANDUZ CENGIZ A.
分类号 H01L21/31 主分类号 H01L21/31
代理机构 代理人
主权项
地址