摘要 |
PURPOSE: A cleaning composition for industrial parts is provided to remove impurities in a short time, to prevent corrosion or damage of a metal layer of the lower part during a removal process, and to ensure remarkable cleaning effect. CONSTITUTION: A cleaning composition for industrial parts comprises quaternary ammonium hydroxide represented by chemical formula 1, hydrophilic organic solvent, corrosion inhibitor, and water. In chemical formula 1, R1 is (C1~C24) hydrocarbon group; and R2, R3 and R4 are hydrogen atom and (C1~C24) hydrocarbon group. The cleaning composition for industrial parts further includes an amine compound. The amine compound is any one selected from the group consisting of hydrazine, hydrazine hydrate, hydrazine derivative, a compound represented by chemical formula 2 and their mixture. In chemical formula 2, R5, R6 and R7 are independently hydrogen or C1~C4 alkyl group. The alkyl group can be substituted with a hydroxyl group. However, all the R5, R6 and R7 are not hydrogen.
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申请人 |
TECHNO SEMICHEM CO., LTD. |
发明人 |
LIM, JUNG HUN;JOO, SANG JIN;KIM, SANG BEOM;PARK, SEONG HWAN;KIM, HYUN TAK;JEONG, CHAN JIN;YOO, CHANG JIN |