发明名称 CLEANING COMPOSITION FOR INDUSTRIAL PARTS
摘要 PURPOSE: A cleaning composition for industrial parts is provided to remove impurities in a short time, to prevent corrosion or damage of a metal layer of the lower part during a removal process, and to ensure remarkable cleaning effect. CONSTITUTION: A cleaning composition for industrial parts comprises quaternary ammonium hydroxide represented by chemical formula 1, hydrophilic organic solvent, corrosion inhibitor, and water. In chemical formula 1, R1 is (C1~C24) hydrocarbon group; and R2, R3 and R4 are hydrogen atom and (C1~C24) hydrocarbon group. The cleaning composition for industrial parts further includes an amine compound. The amine compound is any one selected from the group consisting of hydrazine, hydrazine hydrate, hydrazine derivative, a compound represented by chemical formula 2 and their mixture. In chemical formula 2, R5, R6 and R7 are independently hydrogen or C1~C4 alkyl group. The alkyl group can be substituted with a hydroxyl group. However, all the R5, R6 and R7 are not hydrogen.
申请公布号 KR20090126089(A) 申请公布日期 2009.12.08
申请号 KR20080052268 申请日期 2008.06.03
申请人 TECHNO SEMICHEM CO., LTD. 发明人 LIM, JUNG HUN;JOO, SANG JIN;KIM, SANG BEOM;PARK, SEONG HWAN;KIM, HYUN TAK;JEONG, CHAN JIN;YOO, CHANG JIN
分类号 C11D1/62 主分类号 C11D1/62
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