发明名称 |
Multiple-time flash anneal process |
摘要 |
A method of forming an integrated circuit is provided. The method includes performing a multiple-time flash anneal process to a wafer, wherein the multiple-time flash anneal process comprises preheating the wafer to a first preheat temperature; performing a first flash on the wafer with a first flash energy; preheating the wafer to a second preheat temperature; and performing a second flash on the wafer with a second flash energy.
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申请公布号 |
US7629275(B2) |
申请公布日期 |
2009.12.08 |
申请号 |
US20070698239 |
申请日期 |
2007.01.25 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHEN JENNIFER;CHEN CHI-CHUN;TAO HUN-JAN |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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