发明名称 Mask defect repairing method and semiconductor device manufacturing method
摘要 According to an aspect of the invention, there is provided a mask defect repairing method of repairing a defect caused by a foreign object on a light transmissive photomask, the method including moving the foreign object on a light transmission section of the light transmissive photomask using a manipulator, and placing the foreign object on a shielding section of the light transmissive photo mask.
申请公布号 US7629088(B2) 申请公布日期 2009.12.08
申请号 US20060504049 申请日期 2006.08.15
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ITOH MASAMITSU
分类号 G03F1/24;G03F1/72;G03F1/82;H01L21/027 主分类号 G03F1/24
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