| 摘要 |
PURPOSE: A chemical vapor depositing device is provided to minimize the temperature change of the source gas by circulating cooling water along circulation flow path of the gas box. CONSTITUTION: The susceptor(20) is arranged inside the chamber and the substrate is settled. The shower head(30) is arranged in the upward of susceptor. The first manifold(40) comprises the first gas input path in which the first source gas flows in. The connection block(50) comprises the first gas link pass connected to the first gas input path. The second manifold(60) comprises the second gas input path in which the second gas link pass and the second source gas connected to the first gas link pass flow in. One end of the gas box(70) comprises the third gas link pass which the other end part is connected to the shower head while being connected to the second gas link pass and the second gas input path. The cooling water provided from outside to the inside of the first manifold is flown out through the connection block and the first manifold into the outside of the first manifold.
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