| 摘要 |
PURPOSE: A chamber for manufacturing a semiconductor device is provided to reduce wrong connection error of a gas supply line, by arranging the gas supply line to supply a raw material gas and a cleaning gas in the left and right of the chamber body respectively. CONSTITUTION: A base part(111) has a pumping port formed to go through up and down. An extension part(112) is formed as being extended toward the top from the edge of the base part. A reaction space part(113) is formed as being open toward the top by the bottom part and the extension part. A chamber body(11) comprises a gas flow path(114) which one end is opened to the thickness direction of the extension part and the other end part is opened to the upward. A top lead(12) is connected to the gas flow path, and has a gas connection flow path. The gas flow path comprises a first gas flow path part and a second gas flow path part.
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