| 摘要 |
<p>PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to induce calibration of a substrate table position, by moving a substrate table along a first direction and then measuring the characteristics of an extended pattern along the first direction. CONSTITUTION: Extension patterns(148,149) are formed by more than one line extended along a first direction. The characteristics of the extended patterns are measured at different positions following the first direction by changing relative positions of a sensor. A reference position for the relative position of the sensor and the support table is determined at a second direction vertical to the first direction. The characteristics of the extended pattern are measured using the reference position. A reference position of the second direction is determined on the basis of maximum sensitivity of a signal from the sensor for the detected characteristics. The measurement of the characteristics of the extended pattern is demodulated from the sensor.</p> |
