发明名称 METHOD FOR MANUFACTURING HEATING PLATE OF SUBSTRATE HEATING APPARATUS
摘要 PURPOSE: A method for manufacturing a hot plate of a substrate heating apparatus is provided to improve temperature uniformity of the heating apparatus for a substrate, by performing thermal treatment like hardness improvement and stress release. CONSTITUTION: A hot plate is processed by rough machining(S101). A first annealing is performed to improve hardness of the hot plate after rough machining(S102). A second annealing is performed to remove stress of the hot plate generated during the first annealing process(S103). The machined surface of the hot plate after the second annealing is precisely machined(S104). The surface of the hot plate after precise machining is coated(S105). A substrate is supported on the top of the hot plate by a number of lift pins.
申请公布号 KR20090125567(A) 申请公布日期 2009.12.07
申请号 KR20080051735 申请日期 2008.06.02
申请人 SEMES CO., LTD. 发明人 KANG, UN KYU;KIM, SUNG UN;HAM, HYUNG WON
分类号 H01L21/324;H01L21/027 主分类号 H01L21/324
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