发明名称 PROXIMITY EXPOSURE DEVICE, CHUCK HEIGHT ADJUSTING METHOD OF PROXIMITY EXPOSURE DEVICE AND METHOD OF MANUFACTURING PANEL SUBSTRATE FOR DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To improve the flatness of a chuck by easily adjusting the height at each point supporting the back of the chuck. <P>SOLUTION: An opening is provided closer to the central part side than the peripheral edge part of the chuck 10 holding a substrate 1, and a support plate 40 supporting a lid 14 is provided in the periphery of the opening at the back of the chuck 10. A chuck support table 30 supporting the back of the chuck 10 at a plurality of points is provided with a plurality of height adjusting mechanisms, which adjust the heights of the points supporting the back of the chuck 10. The chuck 10 is mounted on the chuck support table 30, the height adjusting mechanism closer to the central part side than the peripheral edge part of the chuck 10 is operated from the opening, and the other height adjusting mechanisms are operated from the outside of the chuck 10 to thereby adjust the height of each point supporting the back of the chuck 10. The lid 14 is fitted to the opening of the chuck 10. Thus, even when the chuck 10 is large-sized, the height of each point supporting the back of the chuck 10 can be easily adjusted to improve the flatness of the chuck 10. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009282110(A) 申请公布日期 2009.12.03
申请号 JP20080131739 申请日期 2008.05.20
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MARUYAMA KEIICHI;SATO TAKASATO;TAKAHASHI SATOSHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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