| 发明名称 |
ACETYLENIC DIOL ETHYLENE OXIDE/PROPYLENE OXIDE ADDUCT, AND USE OF THE SAME IN DEVELOPER |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a new surfactant that can efficiently reduce surface tension in a developer to be used for a photoresist exposed while minimizing the occurrence of bubbles. SOLUTION: An aqueous alkali photoresist developer composition is provided, which contains an acetylenic diol ethylene oxide/propylene oxide adduct expressed by formula (1) as a surfactant. In the formula, r and t are 1 or 2, (n+m) is 1 to 30, and (p+q) is 1 to 30. COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2009282526(A) |
申请公布日期 |
2009.12.03 |
| 申请号 |
JP20090135633 |
申请日期 |
2009.06.05 |
| 申请人 |
FUJIFILM ELECTRONIC MATERIALS USA INC |
发明人 |
LASSILA KEVIN RODNEY;UHRIN PAULA ANN;SCHWARTZ JOEL |
| 分类号 |
G03F7/004;G03F7/32;A01N25/02;A01N25/30;C07B61/00;C07C41/03;C07C43/178;C09D5/00;C09D5/08;C09D7/12;C09D11/00;C09D201/00;C11D1/722;H01L21/027 |
主分类号 |
G03F7/004 |
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