发明名称 |
PATENT RELATING TO PREVENTION OF SCATTERING OF POLLEN OF CEDAR, CYPRESS, ETC. |
摘要 |
<P>PROBLEM TO BE SOLVED: To develop an allergy countermeasure technique effective for preventing the mass scattering of pollens of causal plants. Ž<P>SOLUTION: Mass scattering of plant pollens can be prevented by forming a coating film on a flower cluster with a viscous polymer compound or polymer substance harmless to the plant. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2009280560(A) |
申请公布日期 |
2009.12.03 |
申请号 |
JP20080159745 |
申请日期 |
2008.05.22 |
申请人 |
JAPAN BIOTECH KK |
发明人 |
HAYASHI KATSUHIKO |
分类号 |
A01N61/00;A01M21/04;A01N25/10;A01N63/00 |
主分类号 |
A01N61/00 |
代理机构 |
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代理人 |
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地址 |
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