发明名称 |
Methods of treating semiconducting materials and treated semiconducting materials |
摘要 |
A method for treating semiconducting materials is disclosed. In the disclosed method, a semiconducting material having a crystalline structure is provided, at least a portion of the semiconducting material is exposed to a heat source to create a melt pool, and the semiconducting material is then cooled. Semiconducting materials treated by the method are also disclosed.
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申请公布号 |
US2009297395(A1) |
申请公布日期 |
2009.12.03 |
申请号 |
US20080156499 |
申请日期 |
2008.06.02 |
申请人 |
MAZUMDER PRANTIK;SONI KAMAL KISHORE;THOMAS CHRISTOPHER SCOTT;VENKATARAMAN NATESAN;COOK GLEN BENNETT |
发明人 |
MAZUMDER PRANTIK;SONI KAMAL KISHORE;THOMAS CHRISTOPHER SCOTT;VENKATARAMAN NATESAN;COOK GLEN BENNETT |
分类号 |
C01B33/02;C22C28/00;C30B1/02 |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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