发明名称 Methods of treating semiconducting materials and treated semiconducting materials
摘要 A method for treating semiconducting materials is disclosed. In the disclosed method, a semiconducting material having a crystalline structure is provided, at least a portion of the semiconducting material is exposed to a heat source to create a melt pool, and the semiconducting material is then cooled. Semiconducting materials treated by the method are also disclosed.
申请公布号 US2009297395(A1) 申请公布日期 2009.12.03
申请号 US20080156499 申请日期 2008.06.02
申请人 MAZUMDER PRANTIK;SONI KAMAL KISHORE;THOMAS CHRISTOPHER SCOTT;VENKATARAMAN NATESAN;COOK GLEN BENNETT 发明人 MAZUMDER PRANTIK;SONI KAMAL KISHORE;THOMAS CHRISTOPHER SCOTT;VENKATARAMAN NATESAN;COOK GLEN BENNETT
分类号 C01B33/02;C22C28/00;C30B1/02 主分类号 C01B33/02
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