发明名称 MASKLESS PROCESS FOR SOLDER BUMPS PRODUCTION
摘要 Methods of producing a solder bump are presented. Preferred methods lack a requirement for photoresist processing or masking a target substrate. Contemplated methods include forming a well around one or more bond pads on a wafer where the walls of the well are formed by a passivation layer material. Contact material can comprise a solder paste or an under bump metallization layer, which can be placed within the wells as a contact bed for solder balls. A priori prepared solder balls, in solid form or in molten form, can deposited on the contact material to produce the solder bump.
申请公布号 WO2009146373(A1) 申请公布日期 2009.12.03
申请号 WO2009US45483 申请日期 2009.05.28
申请人 MVM TECHNOLOIGES, INC.;MACKAY, JOHN;ROSKOS, HENRY 发明人 MACKAY, JOHN;ROSKOS, HENRY
分类号 H01L21/60 主分类号 H01L21/60
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