发明名称 AN ELEMENT, IN PARTICULAR AN OPTICAL ELEMENT, FOR IMMERSION LITHOGRAPHY
摘要 <p>The present invention relates to an optical element (1) having an optically free diameter, the optical element comprising: a material that is transparent to wavelengths in the ultraviolet region, at least one of an oleophobic coating (6, 7) outside of the optically free diameter and an oleophilic coating (9b, 9c) which is transparent to wavelengths in the UV region inside the optically free diameter, wherein at least one of the oleophobic coating (6, 7) and the oleophilic coating (9b, 9c) is at least one of microstructured and arranged on a microstructured surface (2, 4, 5) of the optical element (1). The present invention also relates to an element having at least one contact area that can be brought into contact with an immersion fluid, the contact area comprising a microstructure or nanostructure produced by material removal and/or comprising a coating stabilised with respect to UV irradiation.</p>
申请公布号 WO2009143879(A1) 申请公布日期 2009.12.03
申请号 WO2008EP10141 申请日期 2008.11.29
申请人 CARL ZEISS SMT AG;PAZIDIS, ALEXANDRA;SIX, STEPHAN;DUESING, RUEDIGER;FEDOSENKO, GENNADY;VON PAPEN, TILMANN;ZACZEK, CHRISTOPH;HENSCHEL, WOLFGANG 发明人 PAZIDIS, ALEXANDRA;SIX, STEPHAN;DUESING, RUEDIGER;FEDOSENKO, GENNADY;VON PAPEN, TILMANN;ZACZEK, CHRISTOPH;HENSCHEL, WOLFGANG
分类号 G03F7/20;G02B1/10 主分类号 G03F7/20
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