发明名称 STACK STRUCTURE COMPRISING EPITAXIAL GRAPHENE, METHOD OF FORMING THE STACK STRUCTURE AND ELECTRONIC DEVICE COMPRISING THE STACK STRUCTURE
摘要 <p>PURPOSE: A stack structure comprising epitaxial graphene, method of forming the stack structure and electronic device comprising the stack structure are provided to obtain the dual gate structure having the top gate and bottom gate. CONSTITUTION: The underlying layer is formed on the Si substrate(SUB1). At least one epitaxial graphene(GP1) is included on the underlying layer. The underlying layer is an h- BN(hexagonal boron nitride)(0001) layer. The Ni(111) layer is formed between the Si substrate and underlying layer. The Cu(111) layer is formed between the Si substrate and Ni(111) layer. The Si substrate is the Si(111) substrate or the Si(110) substrate.</p>
申请公布号 KR20090124330(A) 申请公布日期 2009.12.03
申请号 KR20080050467 申请日期 2008.05.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 WOO, YUN SUNG;SEO, SUN AE;KIM, DONG CHUL;CHUNG, HYUN JONG;JEON, DAE YOUNG
分类号 H01L21/20;H01L21/336;H01L29/78 主分类号 H01L21/20
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