| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure aligning method, an exposure aligning program, and an exposure device, can precisely adjuste an exposure position. <P>SOLUTION: The exposure aligning method adjusts an exposure position when an exposed pattern is exposed on a target substrate where a base materia pattern is formed. The method includes a step of acquiring a first misalignment representing an amount of misalignment of the base material pattern from an original point position, a step of acquiring a second misalignment representing an amount of misalignment from the original point position of the base material pattern, for past substrates processed before the target substrate, a step of acquiring a third misalignment representing a difference between the first misalignment and the second misalignment, a step of acquiring a first corrective value for adjusting the exposure position of the target pattern based on the third misalignment, and a step which adjusts the exposure position of the target pattern to the target substrate based on the first corrective value, for exposure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
