| 摘要 |
PROBLEM TO BE SOLVED: To provide a light-absorbing spin-on glass material used for antireflective layers in photolithography, and a method of manufacturing the spin-on glass material. SOLUTION: The spin-on glass material includes a siloxane polymer obtained by polymerizing a strongly light-absorbing compound (a), at least one silane having an easily leaving group (b), and at least one silane compound having an easily leaving group other than (b) (c), wherein the siloxane polymer exhibits the relationship of recess/projection or is located in the region enclosed by the recess/projection relationship with respect to the ratio of (a) to (b) to (c) and the extinction coefficient k value of the siloxane polymer. COPYRIGHT: (C)2010,JPO&INPIT
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