| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment which does not leave a liquid on the front surface of the same face plate. <P>SOLUTION: There is provided exposure equipment 1 which fills a portion between a projection optical system 30 and at least a portion of an object to be processed 40 with a first liquid L1 and which exposes the object to be processed 40 via the first liquid L1. The exposure equipment includes a lighting optical system 14 for lighting a reticle 20 with light from a light source 12, a projection optical system 30 for projecting a pattern of the reticle 20 to the object to be processed 40, a wafer stage 45 which moves holding the object to be processed 40, and the same face plate 50 prepared on the wafer stage 45. The same face plate 50 includes a porous material. The exposure equipment 1 exposes the object to be processed 40 by impregnating the same face plate 50 with a second liquid L2 which is not mixed with the first liquid L1. <P>COPYRIGHT: (C)2010,JPO&INPIT |
