发明名称 |
Inorganic Substrate With A Thin Silica Type Glass Layer, Method of Manufacturing The Aforementioned Substrate, Coating Agent, And A Semiconductor Device |
摘要 |
A method of manufacturing an inorganic substrate coated with a thin silica type glass layer of 2 H to 9 H pencil hardness, said method comprising the steps of: coating an inorganic substrate with a cyclic dihydrogenpolysiloxane and/or a hydrogenpolysiloxane represented by a specific unit formula, and curing it; an inorganic substrate coated with a thin silica type glass layer; a coating agent for an inorganic substrate that is composed of a cyclic dihydrogenpolysiloxane and/or a hydrogenpolysiloxane represented by a specific unit formula; and a semiconductor device having an inorganic substrate coated with a thin silica type glass layer.
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申请公布号 |
US2009293942(A1) |
申请公布日期 |
2009.12.03 |
申请号 |
US20060090694 |
申请日期 |
2006.10.23 |
申请人 |
HARIMOTO YUKINARI;ITOH MAKI;KATSOULIS ELIAS DIMITRIS |
发明人 |
HARIMOTO YUKINARI;ITOH MAKI;KATSOULIS ELIAS DIMITRIS |
分类号 |
H01L31/00;B05D3/00;B05D3/04;B32B17/06;C08F2/46;C08G77/14;H01L29/00 |
主分类号 |
H01L31/00 |
代理机构 |
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主权项 |
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地址 |
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