| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method capable of depositing films including respective layers different in property while improving the adhesion to a substrate and in a way as to have desired shape without decreasing a film deposition speed in forming the films on the surface of a long sized belt-like substrate while feeding the substrate in a longitudinal direction. <P>SOLUTION: The film deposition apparatus 1 includes: a vacuum container 2; a vacuum pump 3 decompressing the vacuum container 2, an evaporation source 4 evaporating a raw material in the vacuum container 2; and substrate feed means (5, 6, 11) for feeding the long sized belt-like substrate 10 in the longitudinal direction so as to pass the position where the evaporated raw material arrives. Also, the film deposition apparatus 1 includes: a cooling plate 15 being a cooling means for cooling the substrate 10; and a gaseous oxygen introducing nozzle 14 for introducing the gaseous oxygen reacting with the raw material to the neighborhood of the substrate. Grooved parts 15a. 15b, 15c are formed on the surface of the cooling plate 15 opposite to the substrate 10. <P>COPYRIGHT: (C)2010,JPO&INPIT |
