| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for processing a photoresist layer and a method for manufacturing a pattern forming substrate by which a plurality of line patterns can be formed in a short period of time. <P>SOLUTION: The method for processing a photoresist layer and the method for manufacturing a pattern forming substrate include: a setting step of fixing a plurality of substrates 61 each having a photoresist layer 62 to the respective setting faces 22 of a support member 2 having a plurality of setting faces 22 placed equidistant from a predetermined center axis 2A; and an exposure step of allowing a laser beam to exit from a head 3, while rotating at least either the head 3 that projects a laser beam onto the photoresist layer 62 or the support member 2 around the center axis 2A as well as moving at least either the head 3 or the support member 2 along the center axis 2A. <P>COPYRIGHT: (C)2010,JPO&INPIT |
