发明名称 |
PHOTOVOLTAICS WITH INTERFEROMETRIC MASKS |
摘要 |
An interferometric mask covering the front electrodes of a photovoltaic device is disclosed. Such an interferometric mask may reduce reflections of incident light from the electrodes. In various embodiments, the mask reduces reflections so that a front electrode pattern appears similar in color to adjacent regions of visible photovoltaic active material. |
申请公布号 |
US2009293955(A1) |
申请公布日期 |
2009.12.03 |
申请号 |
US20070950392 |
申请日期 |
2007.12.04 |
申请人 |
QUALCOMM INCORPORATED |
发明人 |
KOTHARI MANISH;KHAZENI KASRA |
分类号 |
H01L31/052;H01L31/0256;H01L31/18 |
主分类号 |
H01L31/052 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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