发明名称 PHOTOVOLTAICS WITH INTERFEROMETRIC MASKS
摘要 An interferometric mask covering the front electrodes of a photovoltaic device is disclosed. Such an interferometric mask may reduce reflections of incident light from the electrodes. In various embodiments, the mask reduces reflections so that a front electrode pattern appears similar in color to adjacent regions of visible photovoltaic active material.
申请公布号 US2009293955(A1) 申请公布日期 2009.12.03
申请号 US20070950392 申请日期 2007.12.04
申请人 QUALCOMM INCORPORATED 发明人 KOTHARI MANISH;KHAZENI KASRA
分类号 H01L31/052;H01L31/0256;H01L31/18 主分类号 H01L31/052
代理机构 代理人
主权项
地址