发明名称 TWO-STAGE LASER SYSTEM FOR ALIGNER
摘要 PROBLEM TO BE SOLVED: To provide a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. SOLUTION: The two-stage laser system for aligners includes an oscillation-stage laser 50 and an amplification-stage laser 60. Oscillation laser light having divergence is used as the oscillation-stage laser 50, and the amplification-stage laser 60 includes a Fabry-Perot etalon resonator made up of an input side mirror 1 and an output side mirror 2. The resonator is configured as a stable resonator. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009283967(A) 申请公布日期 2009.12.03
申请号 JP20090172996 申请日期 2009.07.24
申请人 KOMATSU LTD;GIGAPHOTON INC 发明人 WAKABAYASHI OSAMU;ARIGA TATSUYA;KUMAZAKI TAKAHITO;SASANO KOTARO
分类号 H01S3/23;G03F7/20 主分类号 H01S3/23
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