发明名称 |
METHOD FOR CLEARING NATIVE OXIDE |
摘要 |
A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.
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申请公布号 |
US2009298294(A1) |
申请公布日期 |
2009.12.03 |
申请号 |
US20080129978 |
申请日期 |
2008.05.30 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
CHEN YEN-CHU;TSAI TENG-CHUN;HUANG CHIEN-CHUNG;LIU KENG-JEN |
分类号 |
C25F3/30;H01L21/302 |
主分类号 |
C25F3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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