METHOD FOR MANUFACTURING A CERAMIC COATING MATERIAL FOR THERMAL SPRAY ON THE PARTS OF SEMICONDUCTOR PROCESSING DEVICES

摘要

PURPOSE: A method for manufacturing a thermal spray coating film for a semiconductor manufacturing apparatus is provided to reduce the inner defect of the coating film. CONSTITUTION: A method for manufacturing a thermal spray coating film comprises the steps of preparing a thermal spray coating material having the composition represented by (Al_x Y_(1-x))2O3 (wherein x is 0.05 ~ 0.95); injecting the thermal spray coating material into the plasma flame to heat it; and laminating the completely molten or semi-molten thermal spray coating material on the surface of the parts used in the semiconductor manufacturing apparatus to form a coating film having the amorphous structure.