| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of uniforming foaming structure. <P>SOLUTION: The polishing pad 1 has a polyurethane sheet 2 with the foaming structure. The polyurethane sheet 2 has an isocyanate-group containing compound as a main component, and has a polishing surface P to abut to a polished object via slurry in the polishing process. Hemispherical particulates 3 with resin shells are approximately regularly and evenly dispersed on the polyurethane sheet 2. A hollow cavity is formed at the center of each shell, and a foaming component is disposed in the cavity of the particulate 3. Pores 6 are approximately regularly and evenly formed of the foaming component disposed in the cavities of the particulates 3 in the polyurethane sheet 2. The particulates 3 are enclosed in the pores 6. The pores 6 are formed of gases generated from the foaming component. <P>COPYRIGHT: (C)2010,JPO&INPIT |
