发明名称 METHOD FOR PROCESSING PHOTORESIST LAYER AND METHOD FOR MANUFACTURING CURVED SURFACE MEMBER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for processing a photoresist layer and a method for manufacturing a curved surface member by which the scanning time of a laser beam on a photoresist layer formed on a curved surface can be shortened. <P>SOLUTION: The method for processing a photoresist layer and the method for manufacturing a curved surface member include: a preparation step of preparing a plurality of curved raw materials each having a curved surface 61a having a circular arc in a cross-sectional view (cylindrical lens 61); a resist forming step of forming a photoresist layer 62 on the curved surface 61a of the curved raw material; a setting step of placing the curved surface raw material to a support member 2 so as to align each curved surface 61a of the plurality of curved raw materials along a single circle C; and an exposure step of irradiating the photoresist with a laser beam from a head 3 while rotating the support member 2 around the center axis 2A of the circle C as well as moving the head 3 in the direction of the center axis 2A. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009282278(A) 申请公布日期 2009.12.03
申请号 JP20080134019 申请日期 2008.05.22
申请人 FUJIFILM CORP 发明人 OGAWA SHOTARO;USAMI YOSHIHISA
分类号 G03F7/20 主分类号 G03F7/20
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