Silicon-containing non-oxide ceramic body production

摘要

Production of a silicon-containing non-oxide ceramic body, having surface silicate glaze-forming components of thermal expansion coefficient matching that of the ceramic base material, involves forming the glaze at 600-1770 deg C and taking into account the quantity of reactive silicon dioxide formed in the glaze. Also claimed is a silicon-containing non-oxide ceramic body produced by the above process and having a silicate-based glaze on its surface. Preferably, the body is a sintered silicon nitride or carbide body which is glazed by applying an alkali or alkaline earth metal compound or a rare earth metal compound and chemically reacting the compound with the silicon nitride or carbide in an oxidising atmosphere at 600-1400 deg C (for an alkali or alkaline earth metal compound) or at 1100-1500 deg C (for a rare earth metal compound).