| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for preventing or relieving misalignment etc. of a substrate and a patterning device. <P>SOLUTION: A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
