| 摘要 |
An optical system for producing a pattern of focused spots, such as a maskless lithographic projection system, includes an illuminator, a pattern generator, and an imager. The illuminator includes a light source for generating a light beam, a homogenizer for evenly dispersing light within the light beam, and a condenser for coupling the light source to the homogenizer. The pattern generator has individually addressable elements illuminated by the light beam from the illuminator. The imager images the addressable elements of the pattern generator onto corresponding focusing elements for forming focused spots that are conjugate to aperture stops in both the imager and the illuminator. The illuminator underfills the imager aperture stop for reducing the size of the focused spots. The condenser underfills the illuminator aperture stop for further controlling the size and shape of the focused spots.
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