发明名称 ELECTROLESS NICKEL LEVELING OF LGA PAD SITES FOR HIGH PERFORMANCE ORGANIC LGA
摘要 A structure comprises: a substrate; at least one conductor on the substrate; at least one contact pad on the substrate; a mask over the conductor (wherein the mask comprises an opening over the contact pad and wherein the mask comprises a bottom surface contacting the substrate and a top surface opposite the bottom surface); and a contact pad plating layer on the contact pad and within the opening of the mask. The contact pad plating layer comprises a bottom surface contacting the contact pad and a top surface opposite the bottom surface, and the top surface of the contact pad plating layer is coplanar with the top surface of the mask.
申请公布号 US2009294971(A1) 申请公布日期 2009.12.03
申请号 US20080131298 申请日期 2008.06.02
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BLACKSHEAR EDMUND D.;RUSSELL DAVID J.;DORE KEVIN A.
分类号 H01L23/488;H01L21/44 主分类号 H01L23/488
代理机构 代理人
主权项
地址