发明名称 STRUCTURE OF RELEASE PART IN VACUUM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To uniformly vapor-deposit a vapor deposition material released from a releasing hole on a material to be vapor-deposited. SOLUTION: A releasing hole 1 for releasing a vapor deposition material toward a material to be vapor-deposited, arranged opposite to a dispersing vessel 14, is formed in the dispersing vessel 14 into which an evaporated vapor deposition material is introduced. A reflection member 51 in an upside-down state, which has a conical reflection surface whose diameter is smaller than the diameter of an inlet face 1a and becomes larger as it goes away from the inlet face 1a toward outward, is provided at the substrate side from the inlet face 1a of the releasing hole 1 on the axial center of the releasing hole 1. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009280861(A) 申请公布日期 2009.12.03
申请号 JP20080133709 申请日期 2008.05.22
申请人 HITACHI ZOSEN CORP 发明人 AZUMA EMIKO;YANAGI HIROTOSHI;MIYASHITA MASASHI
分类号 C23C14/24 主分类号 C23C14/24
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