发明名称 DEPOSITION METHOD AND METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE
摘要 PURPOSE: A deposition method and a method for manufacturing a light emitting device are provided to obtain a desired pattern shape of a material layer smoothly by improving through-put when different plural material layers are sputtered. CONSTITUTION: A light absorption layer(102) is formed in one side of a first substrate(104). A first material layer(103R), a second material layer(103G) and a third material layer(103B) are formed on the light absorption layer. A second substrate(137) is installed in order for one side of the second substrate faces with one plane of the first substrate. The first material layer is evaporated by irradiation of a light. A layer including a first organic compound is formed on the second substrate. A first organic compound, a second organic compound and a third organic compound are low molecular material.
申请公布号 KR20090124948(A) 申请公布日期 2009.12.03
申请号 KR20090045754 申请日期 2009.05.26
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;TANAKA KOICHIRO;IKEDA HISAO;SEO SATOSHI
分类号 H01L51/56;H01L51/54;H05B33/10 主分类号 H01L51/56
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