VACUUM CHUK OF LLOYD-TYPE INTERFERENCE LITHOGRAPHY SYSTEM

摘要

PURPOSE: A vacuum chuck of Lloyd-type interference lithography system is provided to minimize the failure rate generation of substrate and to reduce the error formed in substrate of pattern and to improve the production efficiency. CONSTITUTION: The light source outputs the light. The mirror(70) reflects the light. The vacuum chuck(10) fixes substrate. The spinning table(90) controls post and the angle to which mirror and vacuum chuck are fixed. A plurality of pins(20) is fixed to the back side of the vacuum chuck. The guide frame(30) has a plurality of holes for penetrating the other end of the pin. The permanent magnet(40) is fixed at the other end of the pin while accomplishing the point contact.