<p>PURPOSE: A method for manufacturing a solar cell is provided to reduce a process time and a process cost by forming an anti-reflective coating layer without an additional photolithography process. CONSTITUTION: A photoelectric conversion layer(520) to covert an optical signal to an electrical signal is formed on a substrate(510). A window layer(530) is formed on the photoelectric conversion layer. The window layer is a barrier of the carrier generated in the photoelectric conversion layer and passes the optical signal through the photoelectric conversion layer. An ohmic contact layer(540) making the ohmic contact with the window layer is formed on the window layer. The ohmic contact layer is etched using an etching mask. An anti-reflective coating layer(550) is formed by oxidizing the window layer in the exposed surface by etching the ohmic contact layer using the etching mask as a hard mask about the oxidation. A top electrode(560) made of the conductive material is formed on the ohmic contact layer. A bottom electrode(570) made of the conductive material is formed on the lower part of the substrate.</p>
申请公布号
KR20090123554(A)
申请公布日期
2009.12.02
申请号
KR20080049697
申请日期
2008.05.28
申请人
KOREA ADVANCED NANO FAB CENTER
发明人
BAE, SEONG JU;KIM, CHANG ZOO;LEE, JAE JIN;OH, BYUNG DU