发明名称 PROCESSING APPARATUS FOR WASTE GAS
摘要 PURPOSE: A waster gas processor is provided to increase a heat contact area by increasing a remaining time inside a chamber by emitting the gas to a circumferential direction inside a chamber. CONSTITUTION: A heater(110) is formed in a chamber(100) and generates the heat. An inflow part(120) inputs the waste gas to the chamber. A waste gas emitting unit(135) emits the waste gas inputted through the inflow part inside the chamber. The plurality of heaters are equipped along the circumference direction of the chamber. The inflow part is formed in the center of the upper side of the chamber. The waste gas emitting unit is equipped in the chamber and is arranged in the path for inputting the waste gas. The support is formed to input the waste gas to the inflow part while passing through the inflow part.
申请公布号 KR20090123480(A) 申请公布日期 2009.12.02
申请号 KR20080049579 申请日期 2008.05.28
申请人 KOREA PIONICS CO., LTD. 发明人 LEE, HEE RYONG;KIM, MIN HYONG
分类号 H01L21/02;H01L21/00 主分类号 H01L21/02
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