发明名称 |
METHOD FOR PRODUCING PHOTOSENSITIVE RESIN PLATE OR RELIEF PRINTING PLATE HAVING RECESSED AND PROJECTED PATTERN, AND PLATE SURFACE TREATING LIQUID USED IN THE PRODUCTION METHOD |
摘要 |
<p>The present invention provides a process for producing a photosensitive resin plate or relief printing plate having a recessed and projected pattern, which comprises the steps of: making a liquid containing an ink-repellent component (A) and a curing component (B) attach to the plate surface of the photosensitive resin plate or relief printing plate having a recessed and projected pattern prior to the post-treatment step or during the post-treatment step, wherein the ink-repellent component (A) comprises at least one compound selected from the group consisting of silicon-based compounds, fluorine-based compounds and paraffin-based compounds, and provides a treatment liquid which is suitable for the process for producing the photosensitive resin plate or the relief printing plate having the recessed and projected pattern.</p> |
申请公布号 |
EP2127896(A1) |
申请公布日期 |
2009.12.02 |
申请号 |
EP20080721953 |
申请日期 |
2008.03.12 |
申请人 |
ASAHI KASEI E-MATERIALS CORPORATION |
发明人 |
YAMAZAWA, KAZUYOSHI |
分类号 |
G03F7/32;B41N3/03;B41N1/12;B41N3/08 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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