| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
| 摘要 |
<p>A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.</p> |
| 申请公布号 |
EP1602975(A4) |
申请公布日期 |
2009.12.02 |
| 申请号 |
EP20030789633 |
申请日期 |
2003.12.24 |
| 申请人 |
JSR CORPORATION |
发明人 |
NISHIMURA, ISAO;FUJIWARA, KOUICHI;KOBAYASHI, EIICHI;SHIMOKAWA, TSUTOMU;NAKAMURA, ATSUSHI;YONEDA, EIJI;WANG, YONG |
| 分类号 |
C08F4/00;G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
C08F4/00 |
| 代理机构 |
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代理人 |
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