发明名称 |
Cleaning Apparatus |
摘要 |
<p>In one of the many embodiments, a method for processing a substrate is provided which includes generating a first fluid meniscus and a second fluid meniscus on a surface of the substrate where the first fluid meniscus being substantially adjacent to the second fluid meniscus. The meniscus also includes substantially separating the first fluid meniscus and the second fluid meniscus with a barrier.
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申请公布号 |
EP1612845(A3) |
申请公布日期 |
2009.12.02 |
申请号 |
EP20050253879 |
申请日期 |
2005.06.22 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
O'DONNELL, ROBERT J.;ANDERSON, THOMAS W. |
分类号 |
H01L21/00;F26B3/00;F26B7/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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