发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, PIXEL BARRIER AND METHOD FOR FORMING THE SAME, SUBSTRATE WITH PIXEL BARRIER, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND DISPLAY DEVICE
摘要 Disclosed is a photosensitive resin composition which is suppressed in emission of a fluorine-containing compound component during a heat treatment. Also disclosed are a photosensitive transfer material, a pixel barrier using the photosensitive resin composition or the photosensitive transfer material, a method for forming such a pixel barrier, a substrate with pixel barrier, a color filter, a method for producing a color filter, and a display device. The photosensitive resin composition contains an initiator, an ethylenically unsaturated compound and a fluorine-containing compound. In this composition, the heat reduction rate of the fluorine-containing compound when it is kept at 150°C for 30 minutes is not more than 30% by mass.
申请公布号 KR20090123848(A) 申请公布日期 2009.12.02
申请号 KR20097004355 申请日期 2007.12.18
申请人 FUJIFILM CORPORATION 发明人 ARIOKA DAISUKE;KASHIWAGI DAISUKE
分类号 G03F7/027;G02B5/20;G03F7/033 主分类号 G03F7/027
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