发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, PIXEL BARRIER AND METHOD FOR FORMING THE SAME, SUBSTRATE WITH PIXEL BARRIER, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND DISPLAY DEVICE |
摘要 |
Disclosed is a photosensitive resin composition which is suppressed in emission of a fluorine-containing compound component during a heat treatment. Also disclosed are a photosensitive transfer material, a pixel barrier using the photosensitive resin composition or the photosensitive transfer material, a method for forming such a pixel barrier, a substrate with pixel barrier, a color filter, a method for producing a color filter, and a display device. The photosensitive resin composition contains an initiator, an ethylenically unsaturated compound and a fluorine-containing compound. In this composition, the heat reduction rate of the fluorine-containing compound when it is kept at 150°C for 30 minutes is not more than 30% by mass. |
申请公布号 |
KR20090123848(A) |
申请公布日期 |
2009.12.02 |
申请号 |
KR20097004355 |
申请日期 |
2007.12.18 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
ARIOKA DAISUKE;KASHIWAGI DAISUKE |
分类号 |
G03F7/027;G02B5/20;G03F7/033 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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