| 摘要 |
PURPOSE: A stabilized cyclic alkene composition is provided to ensure improved dynamic stability and to be used in a chemical vapor deposition process requiring cyclic alkene. CONSTITUTION: A stabilized cyclic alkene composition comprises: one or more cyclic alkenes; and at least one stabilizer compound of formula (I): R1,R2,R3,R4,R5(C6)OH, wherein R1 through R5 are each independently selected from H, OH, C1-C8 linear, branched, or cyclic alkyl, C1-C8 linear, branched, or cyclic alkoxy and substituted or unsubstituted aryl; wherein said stabilizer compound is present in an amount greater than 200 ppm up to 20,000 ppm, and wherein said stabilizer compound has a boiling point lower than 265 deg.C.
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