发明名称 |
Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry |
摘要 |
A material for purification of a semiconductor polishing slurry that without changing of pH value, is capable of efficiently purifying a polishing slurry to thereby not only prevent metal contamination of a polished object as effectively as possible but also achieve recycling of a polishing slurry without any problem; a relevant module for purification of a semiconductor polishing slurry; and a process for purifying a semiconductor polishing slurry with the use thereof. In particular, a material for purification of a semiconductor polishing slurry characterized in that it comprises a fibrous substrate having a functional group capable of forming a metal chelate or such a functional group together with hydroxyl fixed onto at least the surface thereof. This material for purification of a semiconductor polishing slurry is, for example, used in such a manner that it is inserted in a container fitted with polishing slurry inflow port and outflow port while ensuring passage of polishing slurry flow. |
申请公布号 |
US7625262(B2) |
申请公布日期 |
2009.12.01 |
申请号 |
US20050549294 |
申请日期 |
2005.09.16 |
申请人 |
NOMURA MICRO SCIENCE CO., LTD. |
发明人 |
ABE MITSUGU;NAMBU NOBUYOSHI;ITO OSAMU;OGITSU MASAAKI;INOMATA KAZUO |
分类号 |
B24B7/22;B01J45/00;B01J47/04;B01J47/10;B01J47/12;B01J47/14;B24B37/00;B24B57/02;C02F11/00;C23F1/46;H01L21/304 |
主分类号 |
B24B7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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