| 摘要 |
An exposure apparatus of the present invention includes: an exposure unit configured to expose photoresist coated on a substrate to light to transfer a pattern of a mask to the photoresist with respect to each of shot regions; and a controller configured to obtain a dose of light for each of the shot regions based on a lithography schedule for each of the shot regions, and to cause the exposure unit to expose each of the shot regions to light in accordance with the obtained dose of light.
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