发明名称 Semiconductor pressure sensor and method for manufacturing semiconductor pressure sensor
摘要 A semiconductor pressure sensor includes a diaphragm; a resistor provided on a top surface of the diaphragm; an insulating film formed on the diaphragm and the resistor having a penetrating part exposing a top surface of the resistor; and a wiring pattern formed from the top surface of the resistor exposed by the penetrating part to a top surface of the insulating film; wherein a distance between a first crossing part where a plane orthogonal to the top surface of the diaphragm meets a top end of a side plane of the penetrating part and a second crossing part where the plane orthogonal to the top surface of the diaphragm meets a bottom of the side plane of the penetrating part is equal or greater than a thickness of the insulating film by a factor of a square root of two.
申请公布号 US7624644(B2) 申请公布日期 2009.12.01
申请号 US20080196367 申请日期 2008.08.22
申请人 MITSUMI ELECTRIC CO., LTD. 发明人 FUJIOKA YASUHIDE
分类号 G01L9/02 主分类号 G01L9/02
代理机构 代理人
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