发明名称 Heat treatment apparatus and method of manufacturing substrates
摘要 A heat treatment device and a method of manufacturing substrates capable of reducing the slippage of the substrates when the substrates are supported on support parts comprising plate-like members. The device comprises a support device having the support parts in contact with the substrates and a body part supporting the support parts. Each of the support parts comprises the plate-like members supporting the substrate so as not to come into contact with the peripheral edge portion of the substrate, and a non-contact part communication with the outside without coming into contact with the substrate is formed in the substrate placing surface of the support part. The overall opening area of the portion of the non-contact part communicating with the outside is 25 to 94% of the overall area of the substrate placing surface.
申请公布号 US7625205(B2) 申请公布日期 2009.12.01
申请号 US20050663852 申请日期 2005.09.29
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 SASAJIMA RYOTA;NAKAMURA IWAO
分类号 F27D5/00 主分类号 F27D5/00
代理机构 代理人
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